Tuesday, October 19, 2004 3:17:29 pm
Message
From:		Tony Kenyon <t.kenyon@ee.ucl.ac.uk>
Subject:	Re: EPSRC Network in Plasma Technology
To:		"Y.M.Mckay" <Y.M.Mckay@open.ac.uk>
Cc:		"a.d.r.phelps" <a.d.r.phelps@strath.ac.uk>
"mike.ashfold" <mike.ashfold@bristol.ac.uk>
declan <declan@astro.gla.ac.uk>
"gus.hancock" <gus.hancock@chem.ox.ac.uk>
"j.i.b.wilson" <j.i.b.wilson@hw.ac.uk>
"N.J.Mason" <N.J.Mason@open.ac.uk>
rac <rac@st-andrews.ac.uk>
"r.devonshire" <r.devonshire@sheffield.ac.uk>
"christopher.whitehead" <christopher.whitehead@man.ac.uk>
"N.S.Braithwaite Braithwaite" <N.S.Braithwaite@open.ac.uk>
"m.g.kong" <m.g.kong@lboro.ac.uk>
"pd.maguire" <pd.maguire@ulster.ac.uk>
zb10 <zb10@cam.ac.uk>
"r.jackman jackman" <r.jackman@ee.ucl.ac.uk>
Bcc:		Nick Braithwaite

 Dear Nigel and Nick,

I'd be very happy to be part of this network. I'm most interested in theme 7 - diagnostics, and would also be happy to coordinate this theme if nobody else steps forward. Below is a short paragraph highlighting the importance of accurate diagnostics - is this the sort of thing you need? Let me know when you want the letter of support.

Regards,

Tony

Modern plasma deposition and etching processes rely on a high degree of stability, repeatability, and short cycle times. To achieve this, accurate plasma diagnostics, and prediction of chamber health and wafer state, are required for automatic control loop strategies to be employed. In order to achieve the precise degree of control required by the modern semiconductor industry, accurate and non-invasive diagnostic probes are required to monitor the status of, for example, etch processes. Such diagnostics become increasingly important as feature sizes grow ever smaller and the capital investment represented by individual wafers becomes ever greater. The cost of a major fault occurring during automated batch processing of a single set of wafers is now in the region of hundreds of thousands of dollars - the potential savings promised by an accurate and real-time diagnostic technique are therefore very significant. 


On 18 Oct 2004, at 10:52 am, Y.M.Mckay wrote:

Message from Professors Braithwaite/Mason:

Dear Plasma-colleagues,

Nigel and Nick would greatly appreciate some feedback to the attached outline plan for a network, which it is hoped you would be interested in joining. Comments by 19.10.04 will be particularly welcome. We hope to despatch by 29.10.04.
 <<EPSRC Plasma Network LETTER.doc>> 
<EPSRC Plasma Network LETTER.doc>
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Dr A.J. Kenyon
Senior Lecturer
Department of Electronic & Electrical Engineering
University College London
Torrington Place
London WC1E 7JE

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